Plasma Chemistry and Plasma Processing

The scientific journal Plasma Chemistry and Plasma Processing is included in the Scopus database. Based on 2020, SJR is 0.59. Publisher country is الولايات المتحدة الأمريكية. The main subject areas of published articles are Chemical Engineering(all), Chemistry(all), Surfaces, Coatings and Films, Condensed Matter Physics.

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Percentile Scopus ASJC Code Scopus Sub-Subject Area Quartile
83 2508 Surfaces, Coatings and Films 1
79 1600 Chemistry(all) 1
83 1500 Chemical Engineering(all) 1
81 3104 Condensed Matter Physics 1
CiteScore Source ID
5,4 https://scopus.com/sourceid/13689
Web Site Articles in 2018 Articles in 2019 Articles in 2020
Link 80 94 118

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19327447
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  • ISSN: 02724324
  • The scientific journal is included in the Scopus database.
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